Workshop Committee
General Chair
Peter Raad, South. Methodist U., USA
Vice General Chair
Marta Rencz, BME, Budapest, Hungary
Programme Chair
Bernhard Wunderle, TU Chemnitz, Germany
Vice Programme Chair
Andras Poppe, BME, Budapest, Hungary
Steering Committee
M. Rencz, BME, Budapest, Hungary (chair)
B. Courtois, CMP, France
J. Janssen, NXP Semiconductors, Nijmegen, Netherlands
A. Napieralski, TU Lodz, Poland
J. Parry, Mentor Graphics, UK
P. Raad, SMU, USA
A. Rubio, U. Politècnica de Catalunya, Spain
B. Wunderle, TU Chemnitz, Germany
Programme Committee
| Name | Company |
|---|---|
| J . Altet | U. Politècnica de Catalunya, Spain |
| M. Abo Ras | Berliner Nanotest und Design GmbH |
| T. Baba | Nat. Metrology Institute Tsukuba, Japan |
| I. Barsony | Institute for Technical Physics and Materials Science (MFA) |
| S. Bouwstra | MEMS Technical Consultancy, Amsterdam, The Netherlands |
| K. Chakrabarty | Duke, USA |
| O. Chapuis | CIN2-CSIC, Barcelona, Spain |
| L. Codecasa | Polit. di Milano, Italy |
| A. Daniel | Intel, USA |
| R. Egawa | Tohoku U., Japan |
| V. Eveloy | The Petroleum Inst., UAE |
| S. Garimella | Purdue U, West Lafayette, USA |
| Y. C. Gerstenmaier | Siemens, Germany |
| A. Glezer | The Georgia Institute of Technology, USA |
| A. Gupta | Freescale Semiconductor Inc., Austin, USA |
| J. Janssen | NXP Semiconductors, Nijmegen, The Netherlands |
| X. Jorda | Centro Nacional de Microelectronica, Spain |
| J. Keller | AMIC Angewandte Micro-Messtechnik GmbH, Germany |
| W. Luiten | Philips Applied Technologies, Eindhoven, The Netherlands |
| W. C. Maia | THALES-EPM, Meudon-la-Foret, France |
| B. Michel | Fraunhofer Institute for Electronic Nanosystems – ENAS, Germany |
| B. Michel | IBM Zurich, Rueschlikon, Switzerland |
| A. Napieralski | TU Lodz, Poland |
| H. Oppermann | Fraunhofer Institute for Reliabilty and Microintegration - IZM, Germany |
| X. Perpina | Centro Nacional de Microelectrónica, Spain |
| T. Persoons | Purdue University, USA |
| P. Rodgers | The Petroleum Inst., UAE |
| A. Rubio | U. Politècnica de Catalunya, Spain |
| S. Sapatnekar | U. of Minnesota, USA |
| R. Schacht | Lausitz University of Applied Science (FH), Germany |
| D. Schweitzer | Infineon Technologies AG |
| Y. Scudeller | E.Polytech. U. Nantes, France |
| A. Shakouri | Purdue University, USA |
| E. Suhir | UC Santa Cruz, USA |
| A. Tay | NUS, Singapore |
| V. Tsoi | Huawei Technologies Sweden |
| B. Vandevelde | IMEC, Belgium |
| S. Volz | Ecole Centrale Paris, France |
| G. Wachutka | TU München, Germany |
| J. Yu | Philips Research, The Netherlands |
| T. Zahner | OSRAM, Germany |